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A Low-Temperature Growth Method of Poly-Si with Memory Application

Thomas Attia Mih, 2019
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The book "A Low-Temperature Growth Method of Poly-Si with Memory Application" by Thomas Attia Mih offers a comprehensive analysis of new technologies in the field of data storage. In light of the growing demands for ultra-high-density storage solutions driven by concepts such as cloud computing, big data, and the Internet of Things, the work explores innovative approaches to overcoming the challenges associated with the conventional production of poly-Si films. In particular, it presents a novel method for producing poly-Si films at low temperatures of 400°C, which preserves the integrity of the underlying layers and enhances the efficiency of 3D flash memory technologies. The book not only provides insights into the production of these films but also into the various deposition methods of silicon films and the development of emerging storage devices.

Key specifications

Author
Thomas Attia Mih
Book cover
Paperback
Year
2019
Item number
56054598

General information

Publisher
Scholar'S Press
Category
Reference books
Release date
11.3.2025

Book properties

Author
Thomas Attia Mih
Year
2019
Book cover
Paperback
Year
2019

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