The book "Structural, Optical and Electrical Properties of NiTPP Thin Films" offers a comprehensive investigation of the structural, optical, and electrical properties of NiTPP thin films. It discusses the analysis of the crystalline structure and physical properties of these materials using various methods such as differential thermal analysis, thermogravimetry, X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and Fourier-transform infrared spectroscopy. The results show that the as-deposited thin films are amorphous, while the films obtained after annealing exhibit a polycrystalline structure. Furthermore, the optical properties are examined through spectrophotometric measurements to determine the refractive index and absorption index. The electrical properties are analyzed in terms of the conduction mechanism and semiconductor characteristics, with the NiTPP films identified as p-type semiconductors.